Ideal for pattern correction! NUV objective lens
Laser objective lens
NUVPlan20X・・・WD12mm、N.A. 0.5 NUVPlan50X・・・WD10mm、N.A. 0.52
- Company:清和光学製作所
- Price:Other
1~6 item / All 6 items
Laser objective lens
NUVPlan20X・・・WD12mm、N.A. 0.5 NUVPlan50X・・・WD10mm、N.A. 0.52
Ideal for observing the back surface of wafers! It features a long working distance and high-resolution objective lens.
The "PE lR Plan Objective Series" is a long working distance, high-resolution objective lens designed for high spectral transmittance in the near-infrared range. It can be used to observe the backside of wafers by transmitting through silicon, or as a lens for photoemission failure analysis. When mounted on our microscope "PS-888L" and used in conjunction with a YAG laser, it can also be utilized for laser repair, among other applications. *It is compatible with LCD glass correction and silicon correction, so please feel free to consult us. 【Features】 ■ Lens for photoemission ■ Long working distance, high-resolution objective lens ■ Usable for laser repair and more *For more details, please refer to the catalog or feel free to contact us.
Ideal for use with white light interferometers! Interference fringes that accommodate the height differences of the sample can be obtained.
The "MlF Series" is an objective lens designed for use with white light interferometers. Interference fringes corresponding to the height differences of the sample can be obtained through the built-in beam splitter and reference mirror along with the sample image at the focus position. For custom-made products, we will manufacture them after consulting on aspects such as the presence of a shutter and the adjustment method for the reference mirror. We can also provide reference mirrors with reflectivity tailored to the target object. 【Features】 ■ Built-in beam splitter ■ Accommodates height differences of the sample ■ Custom manufacturing available *For more details, please refer to the catalog or feel free to contact us.
Long working distance objective lens ideal for thin film processing such as semiconductor circuits and LCD repairs.
The "UV/DUV Plan APO20X・50X" is a long working distance objective lens for bright field observation. It is corrected to focus at wavelengths used in the visible range and near ultraviolet. Designed with high spectral transmittance in the near ultraviolet region, it is optimal for thin film processing such as semiconductor circuit and LCD repairs when used with a microscope and YAG laser. 【Features】 ■ For bright field observation ■ Designed for high spectral transmittance ■ Ideal for thin film processing *For more details, please refer to the catalog or feel free to contact us.
It demonstrates its power in detecting extremely weak light emissions caused by current leakage during fault analysis.
The "PElR2000HR 20X・50X" is an objective lens that maintains over 80% transmittance at 2000nm. It demonstrates its power in detecting extremely weak emissions caused by current leakage in semiconductor device failure analysis. It allows observation of highly integrated, multi-layered semiconductor devices through infrared light that passes through the silicon from the back of the chip. *Silicon correction is available, so please consult us. 【Features】 ■ Maintains over 80% transmittance at 2000nm ■ Effective in detecting extremely weak emissions ■ Silicon correction available *For more details, please refer to the catalog or feel free to contact us.
Interference objective lens
2-beam interference objective lens" "Linnik-type interference objective lens